Visible Wavelength Color Filters Using Dielectric Subwavelength Gratings for Backside-Illuminated CMOS Image Sensor Technologies

Author:

Horie Yu1ORCID,Han Seunghoon2,Lee Jeong-Yub2,Kim Jaekwan2,Kim Yongsung2,Arbabi Amir1ORCID,Shin Changgyun2,Shi Lilong3,Arbabi Ehsan1,Kamali Seyedeh Mahsa1,Lee Hong-Seok2,Hwang Sungwoo2,Faraon Andrei1

Affiliation:

1. T. J. Watson Laboratory of Applied Physics, California Institute of Technology, 1200 East California Boulevard, Pasadena, California 91125, United States

2. Samsung Advanced Institute of Technology, Samsung Electronics, Yeongtong-gu, Suwon-si, Gyeonggi-do 443-803, South Korea

3. Advanced Image Research Lab, Samsung Electronics, 2 North Lake Avenue, Pasadena, California 91101, United States

Funder

Samsung

Basic Energy Sciences

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Reference32 articles.

1. Ahn, J.; Moon, C.R.; Kim, B.; Lee, K.; Kim, Y.; Lim, M.; Lee, W.; Park, H.; Moon, K.; Yoo, J.; Lee, Y. Y. Y.; Park, B.; Jung, S.; Lee, J.; Lee, T.H.; Lee, Y. Y. Y.; Jung, J.; Kim, J.H.; Kim, T.C.; Cho, H.; Lee, D.; Lee, Y. Y. Y.Advanced image sensor technology for pixel scaling down toward 1.0 μm.2008 IEEE International Electron Devices Meeting. 2008; pp1–4.

2. Roadmap for CMOS image sensors: Moore meets Planck and Sommerfeld

3. Transmissive/Reflective Structural Color Filters: Theory and Applications

4. Plasmonic Color Filters for CMOS Image Sensor Applications

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