Author:
Kleineberg Ulf,Lin Jingquan,Neuhaeusler Ulrich,Slieh Jawad,Heinzmann Ulrich,Weber Nils,Escher Matthias,Merkel Michael,Oelsner Andreas,Valsaitsev Dima,Schoenhense Gerd
Cited by
5 articles.
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1. Applications in Other Fields;Surface Microscopy with Low Energy Electrons;2014
2. Next-generation lithography for 22 and 16 nm technology nodes and beyond;Science China Information Sciences;2011-05
3. Wavelength-specific reflections: A decade of extreme ultraviolet actinic mask inspection research;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2010-11
4. EUV mask infrastructure challenges;23rd European Mask and Lithography Conference;2007-02-08
5. Extreme ultraviolet lithography: A review;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2007