Antimony photoresists for EUV lithography: mechanistic studies
Author:
Affiliation:
1. SUNY Polytechnic Institute (United States)
Publisher
SPIE
Reference24 articles.
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2. Organometallic and coordinative photoresist materials for EUV lithography and related photolytic mechanisms;Coordination Chemistry Reviews;2023-10
3. Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy;Journal of Materials Chemistry C;2020
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5. Isotopic Labeling Studies of EUV Photoresists Containing Antimony;Journal of Photopolymer Science and Technology;2018-06-25
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