Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy-Reference-Cited by-同舟云学术

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Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy

Published:2020 Issue:42 Volume:8 Page:14757-14765
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Wu Lianjia¹²³⁴^ORCID,Bespalov Ivan¹²³⁴,Witte Katharina⁵⁶⁷⁸,Lugier Olivier¹²³⁴^ORCID,Haitjema Jarich¹²³⁴^ORCID,Vockenhuber Michaela⁵⁶⁷⁸,Ekinci Yasin⁵⁶⁷⁸^ORCID,Watts Benjamin⁵⁶⁷⁸^ORCID,Brouwer Albert M.¹²³⁴⁹^ORCID,Castellanos Sonia¹²³⁴^ORCID

Affiliation:

1. Advanced Research Center for Nanolithography

2. Science Park 106

3. 1098 XG Amsterdam

4. The Netherlands

5. Paul Scherrer Institute

6. Forschungstrasse 111

7. Villigen 5232

8. Switzerland

9. van’t Hoff Institute for Molecular Sciences

Abstract

A fluorinated ligand in an extreme ultraviolet hybrid photoresist yields C–F bond dissociation upon exposure, thus enhancing its overall sensitivity.

Funder

Bundesministerium für Bildung und Forschung

H2020 Marie Skłodowska-Curie Actions

Seventh Framework Programme

Nederlandse Organisatie voor Wetenschappelijk Onderzoek

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2020/TC/D0TC03216F

Reference63 articles.

1. Promising Lithography Techniques for Next-Generation Logic Devices

2. Sub-10 nm patterning using EUV interference lithography

3. EUV resists: What's next?

4. Materials and Processes for Next Generation Lithography , ed. A. Robinson and R. Lawson , Elsevier , 2016 , vol. 11

5. Extreme ultraviolet resist materials for sub-7 nm patterning

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