Plasma etching antireflection nanostructures on optical elements in concentrator photovoltaic systems-Reference-Cited by-同舟云学术

Plasma etching antireflection nanostructures on optical elements in concentrator photovoltaic systems

Published:2014-12-29 Issue:1 Volume:5 Page:057006
ISSN:1947-7988
Container-title:Journal of Photonics for Energy
language:en
Short-container-title:J. Photon. Energy

Author:

Tamayo Ruiz Efrain Eduardo¹,Watanabe Kentaroh²,Tamaki Ryo²,Hoshii Takuya¹,Sugiyama Masakazu³,Okada Yoshitaka¹,Miyano Kenjiro²,Cvetkovic Aleksandra⁴,Mohedano Rubén⁴,Hernandez Maikel⁴

Affiliation:

1. University of Tokyo, Research Center for Advanced Science and Technology (RCAST), Meguro-ku, Tokyo 153-8904, JapanbUniversity of Tokyo, School of Engineering, Bunkyo-ku, Tokyo 113-8656, Japan

2. University of Tokyo, Research Center for Advanced Science and Technology (RCAST), Meguro-ku, Tokyo 153-8904, Japan

3. University of Tokyo, School of Engineering, Bunkyo-ku, Tokyo 113-8656, Japan

4. LPI Europe, Campus de Montegancedo, Edificio Cedint, Pozuelo de Alarcón 28223, Spain

Publisher

SPIE-Intl Soc Optical Eng

Subject

Renewable Energy, Sustainability and the Environment,Atomic and Molecular Physics, and Optics

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