An environmentally friendly etching agent: vapor from hot electron-activated liquid water-Reference-Cited by-同舟云学术

An environmentally friendly etching agent: vapor from hot electron-activated liquid water

Published:2016 Issue:10 Volume:18 Page:3098-3105
ISSN:1463-9262
Container-title:Green Chemistry
language:en
Short-container-title:Green Chem.

Author:

Chen Hsiao-Chien¹²³⁴⁵,Mai Fu-Der¹²³⁴⁵,Yang Kuang-Hsuan⁶⁷⁸⁹,Tsai Hui-Yen¹²³⁴⁵,Yang Chih-Ping¹⁰³⁴⁵⁹,Chen Chien-Chung¹¹¹²⁴⁵⁹,Chen Chao-Hsuan¹¹¹²⁴⁵⁹,Liu Yu-Chuan¹²³⁴⁵

Affiliation:

1. Department of Biochemistry and Molecular Cell Biology

2. School of Medicine

3. College of Medicine

4. Taipei Medical University

5. Taipei 11031

6. Department of Materials Science and Engineering

7. Vanung University

8. Chungli City

9. Taiwan

10. Graduate Institute of Medical Science

11. Graduate Institute of Biomedical Materials and Tissue Engineering

12. College of Oral Medicine

Abstract

A novel strategy for an environmentally friendly etching process is proposed based on the vapor from hot electron-activated (HEA) water.

Publisher

Royal Society of Chemistry (RSC)

Subject

Pollution,Environmental Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2016/GC/C6GC00353B

Reference53 articles.

1. Controllable and Facile Fabrication of Gold Nanostructures for Selective Metal-Assisted Etching of Silicon

2. Long-Lasting Antifog Plasma Modification of Transparent Plastics

3. Plasma etching antireflection nanostructures on optical elements in concentrator photovoltaic systems

4. Nanostructured superhydrophobic silk fabric fabricated using the ion beam method

5. A multifunctional nanoporous layer created on glass through a simple alkali corrosion process

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