Methodology for evaluating the information distribution in small angle scattering from periodic nanostructures

Author:

Sunday Daniel F.1,Kline R. Joseph1

Affiliation:

1. National Institute of Standards and Technology, Gaithersburg, Maryland

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. X-ray-based overlay metrology using reciprocal space slicing analysis;Optics Letters;2023-12-05

2. Inline metrology of high aspect ratio hole tilt and center line shift using small-angle x-ray scattering;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-03-22

3. Simulations of the transmission small angle x-ray scattering for three-dimensional architectures;Tenth International Symposium on Precision Mechanical Measurements;2021-11-19

4. Metrology for advanced transistor and memristor devices and materials;Metrology, Inspection, and Process Control for Microlithography XXXIV;2020-03-20

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