1. Characterization of Binary and Attenuated Phase Shift Mask Blanks for 32nm Mask Fabrication;Faure,2008
2. Study and improvement approach to 193-nm radiation damage of attenuated phase-shift mask;Sakamoto,2010
3. Attenuated phase-shift mask with high tolerance for 193-nm radiation damage;Yamazaki,2011
4. Photomask Film Degradation Effects in the Wafer Fab – How To Detect And Monitor Over Time;Whittey,2012