Recent advances in EUV patterning in preparation towards high-NA EUV-Reference-Cited by-同舟云学术

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Recent advances in EUV patterning in preparation towards high-NA EUV

Published:2023-05-01 Issue: Volume: Page:
ISSN:
Container-title:Advances in Patterning Materials and Processes XL
language:
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Author:

Nagahara Seiji,Dauendorffer Arnaud,Thiam Arame,Liu Xiang,Kuwahara Yuhei,Dinh Cong Que,Okada Soichiro,Kawakami Shinichiro,Genjima Hisashi,Nagamine Noriaki,Muramatsu Makoto,Shimura Satoru,Tsuboi Atsushi,Nafus Kathleen,Feurprier Yannick,Demand Marc,Ramaneti Rajesh,Foubert Philippe,De Simone Danilo,Vandenberphe Geert

Publisher

SPIE

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High throughput observation of latent images on resist using laser-based photoemission electron microscopy;Applied Physics Express;2024-08-01

2. Advanced development for contact-holes of metal-oxide resists;International Conference on Extreme Ultraviolet Lithography 2023;2023-11-21

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