Advanced development for contact-holes of metal-oxide resists-Reference-Cited by-同舟云学术

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Advanced development for contact-holes of metal-oxide resists

Published:2023-11-21 Issue: Volume: Page:
ISSN:
Container-title:International Conference on Extreme Ultraviolet Lithography 2023
language:
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Author:

Dinh Cong Que,Nagahara Seiji,Kato Kanzo,Kawakami Shinichiro,Kuwahara Yuhei,Okada Soichiro,Cho Kayoko,Tomori Hikari,Nakamura Junji,Terada Shoichi,Muramatsu Makoto,Krawicz Alexandra,McInerney Kathleen,Antonovich Nathan,Huli Lior

Publisher

SPIE

Reference14 articles.

1. High-resist sensitization by pattern and flood combination lithography;Tagawa,2014

2. PSCAR optimization to reduce EUV resist roughness with sensitization using Resist Formulation Optimizer (RFO);Nagahara,2019

3. Calibrated PSCAR stochastic simulation;Dinh,2019

4. EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity, and stochastic defectivity;Nagahara,2020

5. EUV resist performance enhancement by UV flood exposure for high NA EUV lithography;Dinh,2021

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