Development of CO 2 laser produced Xe plasma EUV light source for microlithography-Reference-Cited by-同舟云学术

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Development of CO 2 laser produced Xe plasma EUV light source for microlithography

Published:2006-03-10 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Mizoguchi Hakaru,Endo Akira,Ariga Tatsuya,Miura Taisuke,Hoshino Hideo,Ueno Yoshifumi,Nakano Masaki,Komori Hiroshi,Sumitani Akira,Abe Tamotsu,Suganuma Takashi,Soumagne Georg,Someya Hiroshi,Takabayashi Yuichi,Toyoda Koichi

Publisher

SPIE

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effi cient Nanosecond Pulse Amplifi cation Using Transverse-Flow Carbon Dioxide Lasers;The Review of Laser Engineering;2014

2. Transverse-flow radio-frequency-excited amplifier seeded by a cavity-dumped CO_2 laser for an extreme ultraviolet light source;Optics Letters;2013-08-22

3. Enhancements of extreme ultraviolet emission using prepulsed Sn laser-produced plasmas for advanced lithography applications;Journal of Applied Physics;2011-10-15

4. CO 2 laser-produced Sn plasma as the solution for high-volume manufacturing EUV lithography;SPIE Proceedings;2007-09-13

5. High average power CO 2 laser MOPA system for Tin target LPP EUV light source;SPIE Proceedings;2007-02-08

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