Experimental method for quantifying acid diffusion in chemically amplified resists-Reference-Cited by-同舟云学术

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Experimental method for quantifying acid diffusion in chemically amplified resists

Published:1999-06-11 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Wallraff Gregory M.,Hinsberg William D.,Houle Frances A.,Morrison Mons D.,Larson Carl E.,Sanchez Martha I.,Hoffnagle John A.,Brock Phillip J.,Breyta Gregory

Publisher

SPIE

Cited by 30 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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4. Resist image quality control via acid diffusion constant and/or photodecomposable quencher concentration in the fabrication of 11 nm half-pitch line-and-space patterns using extreme-ultraviolet lithography;Japanese Journal of Applied Physics;2018-04-19

5. Characterizing acid diffusion lengths in chemically amplified resists from measurements of deprotection kinetics;Journal of Micro/Nanolithography, MEMS, and MOEMS;2014-12-16

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