1. ITRS (International Technology Roadmap for Semiconductors) Report: Lithography, 2013.
2. Self-aligned triple patterning for continuous IC scaling to half-pitch 15nm;Chen,2011
3. Spatial frequency multiplication techniques towards half-pitch 10 nm patterning;Chen,2011
4. Recessive self-aligned double patterning with gap-fill technology;Chen,2011
5. Sidewall spacer quadruple patterning for 15-nm half-pitch;Xu,2011