1. Edge placement: foundation for Moore’s Law extension;Borodovsky,2015
2. Breaking through 1D layout limitations and regaining 2D design freedom Part I: 2D layout decomposition and stitching techniques for hybrid optical and self-aligned multiple patterning;Liu,2015
3. Breaking through 1D layout limitations and regaining 2D design freedom part II: stitching yield modeling and optimization;Zhou,2015
4. A generalized edge-placement yield model for the cut-hole patterning process;Zhang,2014
5. Si2 Open Cell Library, available on line., http://www.si2.org/openeda.si2.org/projects/nangatelib.