Author:
Lorusso Gian F.,Mao Ming,Reijnen Liesbeth,Viatkina Katja,Knops Roel,Rispens Gijsbert,Fliervoet Timon
Reference4 articles.
1. Quantification of shot noise contributions to contact hole local CD nonuniformity;Gronheid,2012
2. EUV stochastic noise analysis and LCDU mitigation by etching on dense contact-hole array patterns;Kim,2014
3. Montgomery, D.C., “Design and Analysis of Experiment,” John Wiley & Sons, Inc. (2009).
4. Aspect ratio dependent etching lag reduction in deep silicon etch processes
Cited by
9 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献