Plasma cleaning of lithium off of collector optics material for use in extreme ultraviolet lithography applications

Author:

Neumann Martin J.

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference23 articles.

1. “International Technology Roadmap for Semiconductors 2005 edition: Lithography,” Report. International Technology Roadmap for Semiconductors (2005).

2. “International Technology Roadmap for Semiconductors: 2005 edition executive summary,” Report. International Technology Roadmap for Semiconductors (2005).

3. Plasma sources for EUV lithography exposure tools

4. High power extreme ultra-violet (EUV) light sources for future lithography

5. U. Stamm and K. Gabel , “Technology for LPP sources,” Chapter 19 inEUV Sources for Lithography, V. Bakshi , Ed., pp. 413–452, SPIE Press, Bellingham, Wash. (2006).

Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Fundamentals and Applications of Plasma Cleaning;Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques;2019

2. Debris transport analysis at the intermediate focus of an extreme ultraviolet light source;Journal of Micro/Nanolithography, MEMS, and MOEMS;2012-05-31

3. Materials for Optical Lithography Tool Application;Annual Review of Materials Research;2009-08-01

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