Graded spin-on organic bottom antireflective coating for high NA lithography-Reference-Cited by-同舟云学术

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Graded spin-on organic bottom antireflective coating for high NA lithography

Published:2008-03-14 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Resist Materials and Processing Technology XXV
language:
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Author:

Goldfarb Dario L.,Burns Sean D.,Vyklicky Libor,Pfeiffer Dirk,Lisi Anthony,Petrillo Karen,Arnold John,Sanders Daniel P.,Clancy Aleksandra,Lang Robert N.,Allen Robert D.,Medeiros David R.,Owe-Yang Dah Chung,Noda Kazumi,Tachibana Seiichiro,Shirai Shozo

Publisher

SPIE

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Functional polymer thin films designed for antifouling materials and biosensors;Chemical Papers;2012-01-01

2. Fabrication of dual damascene BEOL structures using a multilevel multiple exposure (MLME) scheme, part 1: lithographic patterning;SPIE Proceedings;2010-03-11

3. Graded Spin-on Organic Bottom Antireflective Coating for High NA Immersion Lithography;Journal of Photopolymer Science and Technology;2008

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