Source optimization using particle swarm optimization algorithm in photolithography-Reference-Cited by-同舟云学术

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Source optimization using particle swarm optimization algorithm in photolithography

Published:2015-03-18 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Wang Lei,Li Sikun,Wang Xiangzhao,Yan Guanyong,Yang Chaoxing

Publisher

SPIE

Reference30 articles.

1. Resolution Enhancement Techniques in Optical Lithography

2. Inverse lithography source optimization via compressive sensing

3. Optimization of stepper parameters and their influence on OPC;Vallishayee,1996

4. Illuminator design for the printing of regular contact patterns;Burkhardt,1998

5. The customized illumination aperture filter for low k1 photolithography process;Gau,2000

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2. Inverse Lithography Source Optimization via Particle Swarm Optimization and Genetic Combined Algorithm;IEEE Photonics Journal;2023-04

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5. Learning-based compressive sensing method for EUV lithographic source optimization;OPT EXPRESS;2019

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