Analytical analysis for impact of polarization aberration of projection lens on lithographic imaging quality-Reference-Cited by-同舟云学术

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Analytical analysis for impact of polarization aberration of projection lens on lithographic imaging quality

Published:2015-03-18 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Shen Lina,Li Sikun,Wang Xiangzhao,Yan Guanyong

Publisher

SPIE

Reference12 articles.

1. How to describe polarization influence on imaging;Totzeck,2005

2. Polarization Aberration Modeling via Jones Matrix in the Context of OPC;Zhang,2007

3. Optimization procedure of exposure tools with polarization aberrations;Arai,2008

4. Polarization aberration analysis in optical lithography systems;Kye,2006

5. Levinson, et al. Polarization Aberration Analysis Using Pauli-Zernike Representation;Yamamoto,2007

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High-order wavefront aberration measurement method for hyper-NA lithographic projection lens based on a binary target and rotated regression matrix;Optics Communications;2019-01

2. High-Order Aberration Measurement Technique for Immersion Lithography Projection Lens Based on Multi-Polarized illuminations;Acta Optica Sinica;2018

3. General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination;Journal of the Optical Society of America A;2016-05-13

4. Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image;Applied Optics;2016-04-13

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