Interactions between plasma and block copolymers used in directed self-assembly patterning-Reference-Cited by-同舟云学术

Interactions between plasma and block copolymers used in directed self-assembly patterning

Published:2016-03-23 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Sirard Stephen,Azarnouche Laurent,Gurer Emir,Durand William,Maher Michael,Mori Kazunori,Blachut Gregory,Janes Dustin,Asano Yusuke,Someya Yasunobu,Hymes Diane,Graves David,Ellison Christopher J.,Willson C. Grant

Publisher

SPIE

Reference26 articles.

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2. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates

3. Block Copolymer Lithography

4. Patterning with block copolymer thin films

5. Interfacial Design for Block Copolymer Thin Films

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