MAPPER: high-throughput maskless lithography
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SPIE
Cited by 33 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Analysis of Electromechanical Deformation of a MEMS Element of a Reflection-Type Dynamic Mask Based on a Torsional Micromirror;2022 IEEE 23rd International Conference of Young Professionals in Electron Devices and Materials (EDM);2022-06-30
2. Stitch-Aware Routing Considering Smart Boundary for Multiple E-Beam Lithography;2020 International Symposium on VLSI Design, Automation and Test (VLSI-DAT);2020-08
3. A Study of Image Contrast, Stochastic Defectivity, and Optical Proximity Effect in EUV Photolithographic Process Under Typical 5 nm Logic Design Rules;2020 China Semiconductor Technology International Conference (CSTIC);2020-06-26
4. Optimization and characterization of direct UV laser writing system for microscale applications;Journal of Micromechanics and Microengineering;2020-06-22
5. Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al2O3 and its application in imprinting lithography;Beilstein Journal of Nanotechnology;2017-11-09
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