Holistic feedforward control for the 5 nm logic node and beyond-Reference-Cited by-同舟云学术

Holistic feedforward control for the 5 nm logic node and beyond

Published:2019-03-20 Issue: Volume: Page:
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Container-title:Optical Microlithography XXXII
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Author:

Megens Henry,Brinkhof Ralph,Aarts Igor,Kok Haico,Karssemeijer Leendertjan,ten Haaf Gijs,Lee Shawn,Slotboom Daan,de Ruiter Chris,Lyulina Irina,Huisman Simon,Keij Stefan,Mos Evert,Tel Wim,Rijpstra Manouk,Schmitt-Weaver Emil,Bhattacharyya Kaustuve,Socha Robert,Menchtchikov Boris,Kubis Michael,Mulkens Jan

Publisher

SPIE

Reference12 articles.

1. Holistic overlay control for multi-patterning process layers at the 10nm and 7nm nodes;Verstappen,2016

2. Patterning Control Strategies for Minimum Edge Placement Error;Mulkens,2017

3. Holistic approach for overlay and edge placement error to meet the 5nm technology node requirements;Mulkens,2018

4. Computational metrology: enabling full-lot high-density fingerprint information without adding wafer metrology budget, and driving improved monitoring and process control;Kim,2018

5. Computational scanner alignment mark alignment;Menchtchikov,2017

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