Sub-nm topography measurement by deflectometry: flatness standard and wafer nanotopography-Reference-Cited by-同舟云学术

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Sub-nm topography measurement by deflectometry: flatness standard and wafer nanotopography

Published:2002-11-01 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Geckeler Ralf D.,Weingaertner Ingolf

Publisher

SPIE

Cited by 64 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Enhanced-spatial-resolution optical surface profiler based on focusing deflectometry;Optics Express;2022-12-02

2. Raytracing the long trace profiler;Advances in Metrology for X-Ray and EUV Optics IX;2020-08-21

3. Absolute flatness measurements by Fizeau interferometer and 3D scanning deflectometric profiler;Advances in Metrology for X-Ray and EUV Optics IX;2020-08-21

4. Measurement of the flatness or the shapes of mirrors by one-shot projection of structured light dot pattern;Results in Physics;2019-12

5. A precise aperture centring device (ACenD) for autocollimator-based surface measuring profilers;Advances in Metrology for X-Ray and EUV Optics VIII;2019-09-09

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