Etch modeling for accurate full-chip process proximity correction-Reference-Cited by-同舟云学术

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Etch modeling for accurate full-chip process proximity correction

Published:2005-05-12 Issue: Volume: Page:
ISSN:
Container-title:Optical Microlithography XVIII
language:
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Author:

Beale Daniel F.,Shiely James P.

Publisher

SPIE

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. On the origin and evolution of hotspots in multipatterning processes;Journal of Vacuum Science & Technology B;2023-06-06

2. Novel approach of virtual etch target (VET) for efficient litho-to-etch pattern fidelity correction;DTCO and Computational Patterning;2022-05-26

3. Machine Learning for Compact Lithographic Process Models;Machine Learning in VLSI Computer-Aided Design;2019

4. Study of etching bias modeling and correction strategies for compensation of patterning process effects;Microelectronic Engineering;2013-10

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