Author:
Lee Chien-Hsien S.,Wei Yayi,Kelling Mark,Law ShaoBeng,Mobley Morris,Chai K. C.
Cited by
2 articles.
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1. Inorganic hardmask development for extreme ultraviolet patterning;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-07-31
2. Inorganic Hardmask Development for EUV Patterning;Extreme Ultraviolet (EUV) Lithography IX;2018-03-19