Principal components and optimal feature vectors of EUVL stochastic variability: applications of Karhunen-Loève expansion to efficient estimation of stochastic failure probabilities and stochastic metrics
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SPIE
Reference9 articles.
1. Algebraic model for extremely unlikely resist dissolution events
2. Principal component analysis of stochasticity in resist films
3. Stochasticity in extreme-ultraviolet lithography predicted by principal component analysis of Monte Carlo simulated event distributions in resist films
4. Probability prediction of EUV process failure due to resist-exposure stochastic: applications of Gaussian random fields excursions and Rice's formula
5. Gaussian random field EUV stochastic models, their generalizations and lithographically meaningful stochastic metrics
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