Instrument for in situ hard x-ray nanobeam characterization during epitaxial crystallization and materials transformations-Reference-Cited by-同舟云学术

Instrument for in situ hard x-ray nanobeam characterization during epitaxial crystallization and materials transformations

Published:2021-02-01 Issue:2 Volume:92 Page:023908
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Marks Samuel D.¹^ORCID,Quan Peiyu¹^ORCID,Liu Rui¹^ORCID,Highland Matthew J.²^ORCID,Zhou Hua²^ORCID,Kuech Thomas F.¹³^ORCID,Stephenson G. Brian⁴^ORCID,Evans Paul G.¹^ORCID

Affiliation:

1. Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, USA

2. X-ray Science Division, Argonne National Laboratory, Lemont, Illinois 60439, USA

3. Department of Chemical and Biological Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, USA

4. Materials Science Division, Argonne National Laboratory, Lemont, Illinois 60439, USA

Funder

Division of Materials Research

U.S. Department of Energy

Publisher

AIP Publishing

Subject

Instrumentation

Link

https://aip.scitation.org/doi/am-pdf/10.1063/5.0039196

Reference37 articles.

1. Observation of Columnar Microstructure in Step-GradedSi1−xGex/SiFilms Using High-Resolution X-Ray Microdiffraction

2. Structure and strain relaxation mechanisms of ultrathin epitaxial Pr2O3 films on Si(111)

3. Germanium hut nanostressors on freestanding thin silicon membranes

4. Accessing a growth window for SrVO3 thin films

5. Scanning x-ray diffraction with 200nm spatial resolution

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