Isotopic tracing study of the growth of silicon carbide nanocrystals at the SiO2/Si interface by CO annealing
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3173278
Reference20 articles.
1. Opportunities and Technical Strategies for Silicon Carbide Device Development
2. New method for growing silicon carbide on silicon by solid-phase epitaxy: Model and experiment
3. Micropipes and voids at β¨SiC/Si(100) interfaces: an electron microscopy study
4. Thin crystalline 3C-SiC layer growth through carbonization of differently oriented Si substrates
5. Prevention of micropipes and voids at β-SiC/Si(100) interfaces
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1. Effects of annealing with CO and CO2 molecules on oxygen vacancy defect density in amorphous SiO2 formed by thermal oxidation of SiC;Journal of Applied Physics;2018-10-07
2. Influence of CO annealing in metal-oxide-semiconductor capacitors with SiO2 films thermally grown on Si and on SiC;Journal of Applied Physics;2016-01-14
3. 3C-SiC nanocrystal growth on 10° miscut Si(001) surface;Thin Solid Films;2014-04
4. Understanding of CO2 interaction with thermally grown SiO2 on Si using IBA depth profiling techniques;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2013-06
5. Optical properties of hybrid T3Pyr/SiO2/3C-SiC nanowires;Nanoscale Research Letters;2012-12
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