Study of selective amorphous silicon etching to silicon nitride using a pin-to-plate dielectric barrier discharge in atmospheric pressure
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2779096
Reference10 articles.
1. Effect of dual frequency on the plasma characteristics in an internal linear inductively coupled plasma source
2. Ion attachment mass spectrometry of nonequilibrium atmospheric-pressure pulsed remote plasma for SiO2 etching
3. Self-organized pattern formation of an atmospheric pressure plasma jet in a dielectric barrier discharge configuration
4. Field emission properties of carbon nanotubes synthesized by capillary type atmospheric pressure plasma enhanced chemical vapor deposition at low temperature
5. Monte Carlo simulation of high power microwave window breakdown at atmospheric conditions
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