Droplet-based, high-brightness extreme ultraviolet laser plasma source for metrology-Reference-Cited by-同舟云学术

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Droplet-based, high-brightness extreme ultraviolet laser plasma source for metrology

Published:2016-10-28 Issue:16 Volume:120 Page:163304
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Vinokhodov A. Yu.¹^ORCID,Krivokorytov M. S.¹²,Sidelnikov Yu. V.¹³,Krivtsun V. M.¹³,Medvedev V. V.³⁴,Koshelev K. N.¹³

Affiliation:

1. EUV Labs, Sirenevyi Blvd. 1, Troitsk, 142190 Moscow, Russia

2. RnD-ISAN, Promyshlennaya Str. 1A, Troitsk, 108841 Moscow, Russia

3. Insitute for Spectroscopy RAS, Fizicheskay Str. 5, Troitsk, 142190 Moscow, Russia

4. ISTEQ, High Tech Campus 84, 5656 AG Eindhoven, The Netherlands

Funder

Ministry of Education and Science of the Russian Federation

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4966930

Reference29 articles.

1. Lithography gets extreme

2. EUV Sources for Lithography

3. Development of stable extreme-ultraviolet sources for use in lithography exposure systems

4. High-radiance LDP source: clean, reliable, and stable EUV source for mask inspection

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1. Liquid Tin Droplet Generator in Laser-Produced Plasma Extreme Ultraviolet Source: A Review;IEEE Transactions on Instrumentation and Measurement;2024

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3. Micro-pinch formation and extreme ultraviolet emission of laser-induced discharge plasma*;Chinese Physics B;2021-09-01

4. He Buffer Gas for Moderating the Kinetic Energy of Pulsed Laser Deposition Plumes;Crystal Growth & Design;2021-07-28

5. Characterization of angularly resolved EUV emission from 2-µm-wavelength laser-driven Sn plasmas using preformed liquid disk targets;Journal of Physics D: Applied Physics;2021-06-28

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