Insitulaser reflectance interferometry measurement of diamond film growth
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.361406
Reference16 articles.
1. Integrated in situ monitoring of a metalorganic vapor phase epitaxy reactor for II–VI epitaxy
2. In situ spectral reflectance monitoring of III-V epitaxy
3. In situ growth rate measurement and nucleation enhancement for microwave plasma CVD of diamond
4. Chemical vapour deposition and characterization of smooth {100}-faceted diamond films
5. In-situ investigation of low-pressure diamond growth by elastic scattering of light and reflectance spectroscopy
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