Laser deposition of epitaxial titanium nitride films on (100) MgO
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.101881
Reference7 articles.
1. Electrical characteristics of TiN contacts toNsilicon
2. Growth and properties of single crystal TiN films deposited by reactive magnetron sputtering
3. Low‐temperature processing of titanium nitride films by laser physical vapor deposition
4. Generation of high‐energy atomic beams in laser‐superconducting target interactions
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1. Chemical potential gradient induced formation of Kirkendall voids at the epitaxial TiN/MgO interface;Nanoscale;2023
2. High quality superconducting titanium nitride thin film growth using infrared pulsed laser deposition;Superconductor Science and Technology;2018-04-13
3. Electronic band structure of TiN/MgO nanostructures;Japanese Journal of Applied Physics;2017-03-07
4. Plasmonic arrays of titanium nitride nanoparticles fabricated from epitaxial thin films;Optics Express;2016-01-13
5. Heteroepitaxial growth of TiN film on MgO (100) by reactive magnetron sputtering;Nanoscale Research Letters;2014-10-03
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