Electrical characteristics of TiN contacts toNsilicon
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.329512
Reference11 articles.
1. TiN and TaN as diffusion barriers in metallizations to silicon semiconductor devices
2. High‐temperature contact structures for silicon semiconductor devices
3. Investigation of titanium—nitride layers for solar-cell contacts
4. Diffusion barriers in thin films
5. Structure and Electrical Properties of Evaporated and Sputtered Titanium Films
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