Direct synthesis of biaxially textured nickel disilicide thin films by magnetron sputter deposition on low-cost metal tapes for flexible silicon devices-Reference-Cited by-同舟云学术

Direct synthesis of biaxially textured nickel disilicide thin films by magnetron sputter deposition on low-cost metal tapes for flexible silicon devices

Published:2019-02-25 Issue:8 Volume:114 Page:083502
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Li Yongkuan¹²³^ORCID,Gao Ying¹²³,Yao Yao¹²³,Sun Sicong¹²³,Khatiwada Devendra¹²³,Pouladi Sara¹³,Galstyan Eduard¹²³,Rathi Monika¹²³,Dutta Pavel¹²³,Litvinchuk Alexander P.³^ORCID,Ryou Jae-Hyun¹²³^ORCID,Selvamanickam Venkat¹²³

Affiliation:

1. Department of Mechanical Engineering, University of Houston, Houston, Texas 77204, USA

2. Advanced Manufacturing Institute, University of Houston, Houston, Texas 77204, USA

3. Texas Center for Superconductivity, University of Houston, Houston, Texas 77204, USA

Funder

U.S. Department of Energy

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5080283

Reference28 articles.

1. Challenges of nickel silicidation in CMOS technologies

2. Silicide phase formation in Ni∕Si system: Depth-resolved positron annihilation and Rutherford backscattering study

3. Epitaxial nickel disilicide with low resistivity and excellent reliability

4. Silicide formation during reaction between Ni ultra-thin films and Si(001) substrates

5. Formation of nickel disilicide using nickel implantation and rapid thermal annealing

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