Submicron thickness calibration of vapor‐deposited SiO2 films by infrared spectroscopy
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1662212
Reference20 articles.
1. The silicon-silicon dioxide system
2. The silicon-silicon dioxide system
3. General Relationship for the Thermal Oxidation of Silicon
4. General Relationship for the Thermal Oxidation of Silicon
5. General Relationship for the Thermal Oxidation of Silicon
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