Boron diffusion through thin gate oxides: Influence of nitridation and effect on the Si/SiO2interface electrical characteristics
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.353438
Reference18 articles.
1. Boron diffusion effects from p+ polysilicon gate in thin thermal oxide and plasma nitrided oxide
2. Quantitative Auger sputter depth profiling of very thin nitrided oxide
3. Surface Protection and Selective Masking during Diffusion in Silicon
4. Diffusion of Boron in Silicon through Oxide Layer
5. Redistribution of Acceptor and Donor Impurities during Thermal Oxidation of Silicon
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