The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2815674
Reference45 articles.
1. Charged species dynamics in an inductively coupled Ar/SF6 plasma discharge
2. Self-Consistent Particle Modeling of Inductively Coupled CF4Plasmas: Effect of Wafer Biasing
3. Comparison of advanced plasma sources for etching applications. II. Langmuir probe studies of a helicon and a multipole electron cyclotron resonance source
4. Langmuir probe studies of a transformer-coupled plasma, aluminum etcher
5. Etching characteristics and plasma-induced damage of high-k Ba[sub 0.5]Sr[sub 0.5]TiO[sub 3] thin-film capacitors
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