Ti film deposition process of a plasma focus: Study by an experimental design-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Ti film deposition process of a plasma focus: Study by an experimental design

Published:2017-10 Issue:10 Volume:7 Page:105026
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Inestrosa-Izurieta M. J.¹²³^ORCID,Moreno J.¹²³,Davis S.¹²³,Soto L.¹²³

Affiliation:

1. Comisión Chilena de Energía Nuclear, Casilla 188-D, Santiago, Chile

2. Center for Research and Applications in Plasma Physics and Pulsed Power, P4, Santiago-Curicó, Chile

3. Universidad Andres Bello, Departamento de Ciencias Fisicas, Facultad de Ciencias Exactas, Republica 220, Santiago, Chile

Funder

MINEDUC | Comisión Nacional de Investigación Científica y Tecnológica

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4997877

Reference28 articles.

1. High-Energy-Density Pinch Plasma: A Unique Nonconventional Tool for Plasma Nanotechnology

2. New trends and future perspectives on plasma focus research

3. The Dense Plasma Focus: A Versatile Dense Pinch for Diverse Applications

4. Electron lithography using a compact plasma focus

5. Formation of Nano-Crystalline Phase in Hydrogenated Amorphous Silicon Thin Film by Plasma Focus Ion Beam Irradiation

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Development of a Miniaturized 2-Joule Pulsed Plasma Source Based on Plasma Focus Technology: Applications in Extreme Condition Materials and Nanosatellite Orientation;Micromachines;2024-09-01

2. Effect of nanodiamonds surface deposition on hydrophilicity, bulk degradation and in-vitro cell adhesion of 3D-printed polycaprolactone scaffolds for bone tissue engineering;Biomedical Materials;2024-07-15

3. Hyper-radiosensitivity in tumor cells following exposure to low dose pulsed x-rays emitted from a kilojoule plasma focus device;Journal of Applied Physics;2021-10-28

4. Hard X-Ray Emission Detection Using Deep Learning Analysis of the Radiated UHF Electromagnetic Signal From a Plasma Focus Discharge;IEEE Access;2019

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3