Interface trap passivation for SiO2∕(0001¯) C-terminated 4H-SiC
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1938270
Reference26 articles.
1. Significantly improved performance of MOSFETs on silicon carbide using the 15R-SiC polytype
2. Interface trap profile near the band edges at the 4H-SiC/SiO2 interface
3. Band alignment and defect states at SiC/oxide interfaces
4. Identification of the Carbon Dangling Bond Center at the4H−SiC/SiO2Interface by an EPR Study in Oxidized Porous SiC
5. Intrinsic SiC/SiO2 Interface States
Cited by 70 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Surface recombination velocities for 4H–SiC: Dependence of excited carrier concentration and surface passivation;Materials Science in Semiconductor Processing;2024-02
2. Transforming the Petroleum Industry through Catalytic Oxidation Reactions vis-à-vis Preceramic Polymer Catalyst Supports;ACS Omega;2023-09-12
3. Ab initio study for orientation dependence of nitrogen incorporation at 4H-SiC/SiO2 interfaces;Japanese Journal of Applied Physics;2022-03-25
4. Role of oxygen in surface kinetics of SiO2 growth on single crystal SiC at elevated temperatures;Ceramics International;2021-01
5. Edge Termination Design with Strong Process Robustness for 1.2 kV-class 4H-SiC Super Junction V-groove MOSFETs;2020 32nd International Symposium on Power Semiconductor Devices and ICs (ISPSD);2020-09
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3