Measurements and code comparison of wave dispersion and antenna radiation resistance for helicon waves in a high density cylindrical plasma source
Author:
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.873307
Reference26 articles.
1. Pulsed high rate plasma etching with variable Si/SiO2selectivity and variable Si etch profiles
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3. The application of the helicon source to plasma processing
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5. Plasma production by helicon waves
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