Initial nitride formation during plasma-nitridation of cobalt surfaces
Author:
Affiliation:
1. Materials Science Department, University of Texas at Dallas, 600 W Campbell Rd., Richardson, Texas 75080, USA
2. Components Research, Intel Corporation, Hillsboro, Oregon 097124, USA
Funder
National Science Foundation (NSF)
Semiconductor Research Corporation (SRC)
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://scitation.aip.org/deliver/fulltext/aip/journal/apl/109/9/1.4961943.pdf?itemId=/content/aip/journal/apl/109/9/10.1063/1.4961943&mimeType=pdf&containerItemId=content/aip/journal/apl
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1. Epitaxial growth of transition-metal silicides on silicon
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3. Chemical Vapor Deposition of Cobalt Nitride and its Application as an Adhesion-Enhancing Layer for Advanced Copper Interconnects
4. Giant Magnetoresistance from an Electron Waveguide Effect in Cobalt-Copper Multilayers
5. New Possibilities for Tuning Ultrathin Cobalt Film Magnetic Properties by a Noble Metal Overlayer
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