Chemical and electronic structures of cobalt oxynitride films deposited by NH3vs. N2 plasma: theory vs. experiment-Reference-Cited by-同舟云学术

Chemical and electronic structures of cobalt oxynitride films deposited by NH3vs. N2 plasma: theory vs. experiment

Published:2020 Issue:42 Volume:22 Page:24640-24648
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Osonkie Adaeze¹²³⁴^ORCID,Lee Veronica¹²³⁴,Oyelade Adeola¹²³⁴,Mrozek-McCourt Maximillian⁵⁶⁷⁴,Chukwunenye Precious¹²³⁴^ORCID,Golden Teresa D.¹²³⁴,Cundari Thomas R.¹²³⁴^ORCID,Kelber Jeffry A.¹²³⁴^ORCID

Affiliation:

1. Department of Chemistry

2. University of North Texas

3. Denton

4. USA

5. Biology and Physical Science Department

6. Passaic County Community College

7. Paterson

Abstract

The chemical structures of Co oxynitrides – in particular, interactions among N and O atoms bonded to the same cobalt – are of great importance for an array of catalytic and materials applications.

Funder

University of North Texas

National Science Foundation

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2020/CP/D0CP04168H

Reference38 articles.

1. Composition-induced structural, electrical, and magnetic phase transitions in AX-type mixed-valence cobalt oxynitride epitaxial thin films

2. Electrochemical Reactions of Lithium with Transition Metal Nitride Electrodes