Studies on structural, optical and electrical characteristics of zirconia thin films grown by pulsed laser deposition at different oxygen partial pressures
Author:
Publisher
AIP Publishing
Link
http://aip.scitation.org/doi/pdf/10.1063/5.0052595
Reference18 articles.
1. Relative stability, structure, and elastic properties of several phases of pure zirconia
2. Effect of O2 gas partial pressure on structures and dielectric characteristics of rf sputtered ZrO2 thin films
3. International Technology Roadmap for Semiconductors, Semiconductors Industry Association, San Jose, 1999.
4. Structure and thermal stability of MOCVD ZrO2 films on Si (100)
5. Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
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