Nickel nanocrystal formation on HfO2 dielectric for nonvolatile memory device applications-Reference-Cited by-同舟云学术

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Nickel nanocrystal formation on HfO2 dielectric for nonvolatile memory device applications

Published:2005-03-07 Issue:10 Volume:86 Page:103505
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Lee Jong Jin,Harada Yoshinao,Pyun Jung Woo,Kwong Dim-Lee

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1881778

Reference6 articles.

1. Metal nanocrystal memories. I. Device design and fabrication

2. J. J. Lee, X. Wang, W. Bai, N. Lu, J. Liu, and D. L. Kwong, Tech. Dig. VLSI Symposium 2003, p. 33.

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