The role of N in the resputtering inhibition of Si in W–Si–N reactively sputtered thin layers
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1840104
Reference16 articles.
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5. Amorphous Ta–Si–N thin‐film alloys as diffusion barrier in Al/Si metallizations
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