Physical modeling for photo-capacitance characteristics of metal oxide TFTs

Author:

Li Haoyang1ORCID,Zuo Wencai1ORCID,Li Feifan1ORCID,Zhou Zhaohua1ORCID,Xu Miao1,Wang Lei1,Wu Weijing1ORCID,Peng Junbiao1ORCID

Affiliation:

1. State Key Laboratory of Luminescent Materials and Devices, Institute of Polymer Optoelectronic Materials and Devices, South China University of Technology , Guangzhou 510640, China

Abstract

We propose an amorphous metal oxide thin film transistor photo-capacitance model in the depletion region that takes Fermi level splitting and band-bending rearrangement into consideration. The split Fermi level is used to characterize the variation in trapped electrons under illumination. Those trapped electrons are excited by optical energy transport under the electric field induced by gate voltage, changing the charge density in the space charge and inducing the rearrangement of band bending. By comparing the data calculated from the model with the test data under three different illumination conditions, that is, 808, 635, and 520 nm, we verify the correctness of this model. Furthermore, the fitting results were in accordance with the general law: the higher the photon energy, the higher the energy level splitting.

Funder

MOST

NSFC

Science and Technology Program of Guangdong Province

Key Areas of Research and Development Projects of Dongguan

The Fundamental Research Funds for the Central Universities

Publisher

AIP Publishing

Subject

General Physics and Astronomy

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