Estimation of the critical condition for expansion/contraction of single Shockley stacking faults in 4H-SiC PiN diodes
Author:
Affiliation:
1. Department of Electronic Science and Engineering, Kyoto University, Katsura, Nishikyo, Kyoto 615-8510, Japan
Funder
Council for Science, Technology and Innovation
Program on Open Innovation Platform with Enterprises, Research Institute and Academia
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5143690
Reference31 articles.
1. Comparison of 6H-SiC, 3C-SiC, and Si for power devices
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3. Material science and device physics in SiC technology for high-voltage power devices
4. Status and prospects for SiC power MOSFETs
5. Crystal Defects as Source of Anomalous Forward Voltage Increase of 4H-SiC Diodes
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2. Suppression of stacking-fault expansion in 4H-SiC diodes by helium implantation;Applied Physics Express;2024-08-01
3. Effects of proton implantation into 4H-SiC substrate: Stacking faults in epilayer on the substrate;Materials Science in Semiconductor Processing;2024-06
4. Analysis of Effects of Defects on Degradation Mechanism of 1200-V/40-A 4H-SiC Junction Barrier Schottky Diodes Induced by High-Reserve Bias Stress;IEEE Transactions on Electron Devices;2024-05
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