Comparison of negative-ion and positive-ion-assisted etching of silicon
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1400765
Reference11 articles.
1. Negative Ion Kinetics in RF Glow Discharges
2. Modeling electronegative plasma discharges
3. A coupled two-sheath simulation of RF bias at high electronegativities
4. Langmuir probe characteristics in a positive-ion/negative-ion plasma
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1. Highly selective dry etching of polystyrene-poly(methyl methacrylate) block copolymer by gas pulsing carbon monoxide-based plasmas;Journal of Physics D: Applied Physics;2017-04-21
2. Negative Ion Plasmas;Encyclopedia of Plasma Technology;2016-12-12
3. Challenges of Tailoring Surface Chemistry and Plasma/Surface Interactions to Advance Atomic Layer Etching;ECS Journal of Solid State Science and Technology;2015
4. High electronegativity multi-dipolar electron cyclotron resonance plasma source for etching by negative ions;Journal of Applied Physics;2012-04-15
5. Resonance hairpin and Langmuir probe-assisted laser photodetachment measurements of the negative ion density in a pulsed dc magnetron discharge;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2011-05
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