Microcrystalline silicon solar cells deposited at high rates
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1927689
Reference37 articles.
1. Formation kinetics and control of microcrystallite in μc-Si:H from glow discharge plasma
2. Surface hydrogen content and passivation of silicon deposited by plasma induced chemical vapor deposition from silane and the implications for the reaction mechanism
3. High rate growth of microcrystalline silicon at low temperatures
4. Growth of device grade μc-Si film at over 50Å/s using PECVD
5. Analysis of high-rate a-Si:H deposition in a VHF plasma
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