Hydrogen cleaning and smoothing of semiconductor surfaces: The case of II–VI compounds
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.124479
Reference8 articles.
1. Cleaning of MBE GaAs Substrates by Hydrogen Radical Beam Irradiation
2. Etching of GaAs(100) by Activated Hydrogen
3. Low Dislocation Density GaAs on Vicinal Si(100) Grown by Molecular Beam Epitaxy with Atomic Hydrogen Irradiation
4. Characterization of atomic hydrogen-etched HgCdTe surfaces
5. Low‐damage processing of CdTe(110) surfaces using atomic hydrogen
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1. GaAs epitaxy on Si substrates: modern status of research and engineering;Physics-Uspekhi;2008-05-31
2. Desorption of InSb(001) native oxide and surface smoothing induced by low temperature annealing under molecular hydrogen flow;Journal of Applied Physics;2007-01-15
3. 33-µm microcavity light emitter for gas detection;Optics Letters;2000-05-15
4. Equilibrium shape of steps and islands on polar CdTe(001) surface: application to the preparation of self organized templates for growth of nanostructures;Thin Solid Films;2000-05
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